Isolation diffusion process monitor

Patent

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Details

357 51, H01L 2704

Patent

active

047017791

ABSTRACT:
An isolation diffusion process monitor is disclosed. A monitor resistor which has one end terminated in an isolation diffusion region is measured during the wafer fabrication process. Its value will be a function of the lateral surface extent of the isolation diffusion.

REFERENCES:
patent: 3631313 (1971-12-01), Moore
patent: 4223335 (1980-09-01), Kane
patent: 4336528 (1982-06-01), Kane
patent: 4413271 (1983-11-01), Gontowski, Jr. et al.

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