Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-03-20
1987-06-16
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041823, 2041832, B01D 1302
Patent
active
046734830
ABSTRACT:
The disclosure is directed to an improved apparatus and method for isoelectric focusing whereby the reservoirs and recirculating paths in the apparatus are sealed off from the atmosphere. A liquid is employed which contains buffering compounds capable of maintaining a pH gradient in an electric field. A plurality of permeable diaphragms or membranes are used to separate the flows of liquid while allowing interchange of liquid constituents therebetween. A direct current electrical potential is established transverse to the flow, so as to maintain a gradient of pH steps as between successive channels defined by the membranes, and to separate a mixture of amphoteric substances into said channels.
REFERENCES:
patent: 4204929 (1980-05-01), Bier
patent: 4362612 (1982-12-01), Bier
Chapman Terryence
Ionics Incorporated
Niebling John F.
Saliba Norman E.
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