Irradiation system with ion beam/charged particle beam

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S3960ML

Reexamination Certificate

active

11202101

ABSTRACT:
In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.

REFERENCES:
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patent: 5393984 (1995-02-01), Glavish
patent: 5483077 (1996-01-01), Glavish
patent: 6835930 (2004-12-01), Benveniste et al.
patent: 6946667 (2005-09-01), Chen et al.
patent: 7105839 (2006-09-01), White
patent: 2002/0007796 (2002-01-01), Gorokhovsky
patent: 2003/0066976 (2003-04-01), Chen et al.
patent: 2004/0168637 (2004-09-01), Gorokhovsky
patent: 2003-288857 (2003-10-01), None

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