Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1987-09-04
1989-10-24
Michl, Paul R.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
526245, 526246, 526244, 528271, 522 97, 522181, 522168, 522182, 522100, 430285, 430288, C08F 1418
Patent
active
048763225
ABSTRACT:
Linear fluorooligomers having at least two reactive end groups per polymer molecule are incorporated into radiation sensitive polymer systems which have improved continuous temperature resistance and low dielectric constant. The polymer systems can be applied as lacquers. Preferably perfluorated poly-ethers and perfluorated alkanes are used as starting compounds. The polymeric product is usable as a coating for the production of printed multi-layer wirings and economises on through-bores and additional copper intermediate layers. A further field of application exists in the field of integrated semiconductor circuits in VLSI-technology for the production of negative photo-resists.
REFERENCES:
patent: 3055932 (1962-09-01), Verbanic et al.
patent: 3649274 (1972-03-01), Older et al.
patent: 3922479 (1975-11-01), Older et al.
patent: 4309269 (1975-09-01), Parker et al.
patent: 4321404 (1982-03-01), Williams
patent: 4440918 (1984-04-01), Rice et al.
patent: 4504567 (1985-03-01), Yamamoto et al.
patent: 4569962 (1986-02-01), Burguette et al.
Hartmut, Steppan, et al. The Resist Technique--A Chemical Contribution to Electronics, Angewandte Chemie Int. Engl., vol. 21, No. 7, 1982, pp. 455-469.
fLedwith, "IEEE Proceedings", vol. 130, part 1, No. 5, Oct. 1983, pp. 245-251.
Blodget, "Spektrum Der Wissenschaft", Sep. 1983, pp. 94-106.
Eisenbach, "Angewandte Makromolekulare Chemie" (1982), pp. 101-111.
Budde Klaus
Koch Friedrich
Quella Ferdinand
Hamilton Cynthia
Michl Paul R.
Siemens Aktiengesselschaft
LandOfFree
Irradiation cross-linkable thermostable polymer system, for micr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Irradiation cross-linkable thermostable polymer system, for micr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Irradiation cross-linkable thermostable polymer system, for micr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1589951