Irradiation apparatus utilizing linear radiation sources

Details Irradiation apparatus utilizing linear radiation sources Irradiation apparatus utilizing linear radiation sources

1981-06-22

1983-11-15

Walsh, Donald P.

Illumination

Elongated source light unit or support

Plural sources or supports therefor

313638, 362230, 362263, 362290, 362342, F21S 300

Patent

active

044159552

ABSTRACT:
Apparatus is disclosed for uniform exposure of a plurality of objects such as semiconductor wafers to radiation utilizing sources of radiation of linear configuration. The apparatus includes a baffle assembly of particular construction and constitution situated between the linear sources and the region to be irradiated.

REFERENCES:
patent: 2689026 (1954-09-01), Zingone
patent: 2905070 (1959-09-01), Gelb
patent: 2918567 (1959-12-01), Leitz
patent: 3657590 (1972-04-01), Johnson

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