IR-radiation source and method for producing same

Electric lamp and discharge devices – With gas or vapor – Having a particular total or partial pressure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

313634, 315248, 372 60, 331 941, H01J 1720, H01J 6130, H01S 322

Patent

active

053008596

ABSTRACT:
A source of IR-radiation, having an enclosure defining between its walls a sealed-off, electrode-less chamber, the walls having at least one portion transparent to IR-radiation, and the chamber containing a gas mixture of at least one, molecular, IR-active gas, of at least one buffer gas and of at least one noble gas. A method for producing a source of IR-radiation is also described and claimed.

REFERENCES:
patent: 672451 (1901-04-01), Moore
patent: 3393372 (1968-07-01), Vickery et al.
patent: 3428914 (1969-02-01), Bell
patent: 3514604 (1970-05-01), Grojean
patent: 3577069 (1971-05-01), Malnar et al.
patent: 3609587 (1971-09-01), Kolb, Jr. et al.
patent: 3984727 (1976-10-01), Young
patent: 4242645 (1980-12-01), Siemsen et al.
patent: 4485333 (1984-11-01), Goldberg
T. K. McCubbin, Jr. and Yu Hak Hahn, "Infrared Emission of CO.sub.2 -N.su -He Plasmas", vol. 57: pp. 1373-1375, Nov. 1967, Journal of The Optical Society of America.
J. P. S. Haarsma, G. J. De Jong and J. Agteroenbos, "The Preparation and Operation of Electrodeless Discharge Lamps" -A Critical Review, vol. 29B, pp. 1-18, Spectrochimica Acta, Pergamon Press, 1974.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

IR-radiation source and method for producing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with IR-radiation source and method for producing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and IR-radiation source and method for producing same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-514231

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.