Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1998-02-12
1999-10-19
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429806, 20429808, C23C 1434
Patent
active
059683279
ABSTRACT:
A coil shield 64 that blocks the arrival at a substrate 50 of the material released by sputtering is provided to a high frequency coil 61 provided such that it surrounds the ionization space between the target 2 and the substrate holder 5. The coil shield 64 is made of metal, and is grounded, which prevents plasma formation in unnecessary places. The coil shield 64 is hollow, gas blowing holes are uniformly formed over the inner surface facing the ionization space, and the gas is flown toward the ionization space.
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Kobayashi Masahiko
Takahashi Nobuyuki
Anelva Corporation
Mercado Julian A.
Nguyen Nam
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