Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1979-05-31
1980-09-30
Nozick, Bernard
Gas separation
Means within gas stream for conducting concentrate to collector
55138, 55150, 55135, 422174, 361230, B03C 100
Patent
active
042253233
ABSTRACT:
A process for ionization-effected removal of alkali composition from an ultrahigh temperature gaseous mixture containing the composition in vapor form is described. A flow of the hot gaseous mixture is conducted through a flow-through network in intimate contact with a metalliferous surface having a work function of at least 5.3 electron volts. The mixture heats the surface to the requisite temperature for effecting substantial alkali metal ionization. The resulting ions are removed by passing the resulting mixture containing same along a flow path through the lines of force of an electrical field of sufficiently low voltage to avoid both glow discharge and breakdown discharge. The lines of force extend to an electrically conductive ion-collection surface maintained at a sufficiently low temperature such that the ions are retained on the latter surface as a condensed phase.
REFERENCES:
patent: 3071449 (1963-01-01), Shustack
patent: 3180083 (1965-04-01), Heller
patent: 3276202 (1966-10-01), Gary
patent: 3620008 (1971-11-01), Newbold
patent: 4162404 (1979-07-01), Fite et al.
Hughes et al., Methods of Experimental Physics, vol. 4, pp. 393-397, Acedemic Press, (1967).
Kimura Shiro G.
Zarchy Andrew S.
Davis Jr. James C.
General Electric Company
Jackson Richard G.
Nozick Bernard
Webb II Paul R.
LandOfFree
Ionization effected removal of alkali composition from a hot gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ionization effected removal of alkali composition from a hot gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ionization effected removal of alkali composition from a hot gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1167521