Ionization deposition apparatus

Details Ionization deposition apparatus Ionization deposition apparatus

1995-07-12

1996-09-10

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118725, 118730, 1566271, C23C 1600

Patent

active

055542220

ABSTRACT:
An ionization deposition apparatus includes an ion source which is located in a vacuum chamber and which is provided with gas introduction ports for supplying a gaseous film material into the vacuum chamber, a filament unit, which is separated into a plurality of independently controllable filaments, for generating thermoelectrons when the filaments are heated by filament currents, and an anode electrode for accelerating and colliding the thermoelectrons against molecules of the gaseous film material to thereby turn the molecules to plasma. A holder for holding a to-be-deposited object, the holder being placed confronting the anode electrode of the ion source in the vacuum chamber, and connected to a bias source to attract ions in the plasma to a surface of the holder.

REFERENCES:
patent: 4859490 (1989-08-01), Ikegaya et al.
patent: 5058527 (1991-10-01), Ohta et al.
patent: 5146481 (1992-09-01), Garg et al.
"Miniaturization and Weight-saving Technique for a New Model of Brenby", Nikkei Mechanical, Aug. 5, 1991, pp. 46-49 (partial translation).

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