Ion source with substantially planar design

Radiant energy – Ion generation – Field ionization type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S427000

Reexamination Certificate

active

10986456

ABSTRACT:
In certain example embodiments of this invention, there is provide an ion source including an anode and a cathode. In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between the anode and cathode, there is less undesirable build-up on the anode and/or cathode during operation of the ion source so that the source can run more efficiently. Moreover, in certain example embodiments, an insulator such as a ceramic or the like is provided between the anode and cathode.

REFERENCES:
patent: 5656819 (1997-08-01), Greenly
patent: 6002208 (1999-12-01), Maishev et al.
patent: 6037717 (2000-03-01), Maishev et al.
patent: 6147354 (2000-11-01), Maishev et al.
patent: 6153067 (2000-11-01), Maishev et al.
patent: 6242749 (2001-06-01), Maishev et al.
patent: 6246059 (2001-06-01), Maishev et al.
patent: 6359388 (2002-03-01), Petrmichl
patent: RE38358 (2003-12-01), Petrmichl
patent: 6664739 (2003-12-01), Kishinevsky et al.
patent: 6740211 (2004-05-01), Thomsen et al.
patent: 6777030 (2004-08-01), Veerasamy et al.
patent: 6806652 (2004-10-01), Chistyakov
patent: 6815690 (2004-11-01), Veerasamy et al.
patent: 6919672 (2005-07-01), Madocks
patent: 2003/0077402 (2003-04-01), Amann et al.
patent: 2004/0016640 (2004-01-01), Veerasamy et al.
patent: 2004/0074444 (2004-04-01), Vererasamy et al.
patent: 2004/0075060 (2004-04-01), Luten et al.
patent: 2005/0040031 (2005-02-01), Burtner et al.
patent: 2005/0082493 (2005-04-01), Petrmichi
patent: 2005/0104007 (2005-05-01), Veerasamy et al.
“Superconducting Magnetic Hall Effect Ion Source”, IBM Technical Disclosure Bulletin, vol. 35, No. 3, Aug. 1992 (p. 345-346).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion source with substantially planar design does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion source with substantially planar design, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion source with substantially planar design will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3811843

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.