Ion source with particular grid assembly

Details Ion source with particular grid assembly Ion source with particular grid assembly

2008-07-29

2008-07-29

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492100, C315S111310, C315S111810

Reexamination Certificate

active

07405415

ABSTRACT:
An ion source (1) to be used in optical thin film deposition by IAD process includes a discharge chamber (10), a gas source, an actuator (11), a grid assembly (20) and an outer shell (30). The grid assembly includes a screen grid (21), an accelerator grid (22) and a decelerator grid (23). The screen grid is kept at anode potential and is disposed near the ions. The accelerator grid is kept at cathode potential and is spaced from the screen grid. The decelerator grid is equal to the ground and is disposed beyond the accelerator grid. Each grid has a curved central portion (24) defining a plurality of apertures aligned with those of the other two grids to form extraction channels for an ion beam (40). When disposing the grid assembly at one end of the discharge chamber, the curved central portions of the three grids are arranged in an inwardly curved manner toward the interior of the discharge chamber, and thus the ion beam is extracted from the grid assembly in a converged manner to have a sequentially reduced cross-sectional area.

REFERENCES:
patent: 4446403 (1984-05-01), Cuomo et al.
patent: 4873467 (1989-10-01), Kaufman et al.
patent: 6319326 (2001-11-01), Koh et al.
patent: 6346768 (2002-02-01), Proudfoot
patent: 6378290 (2002-04-01), Killinger et al.
patent: 2007/0076833 (2007-04-01), Becker et al.

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