Ion source with controlled superposition of electrostatic...

Radiant energy – With charged particle beam deflection or focussing – With target means

Reexamination Certificate

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C250S3960ML, C250S281000, C250S282000, C250S286000, C250S287000

Reexamination Certificate

active

07138642

ABSTRACT:
Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.

REFERENCES:
patent: 4963736 (1990-10-01), Douglas et al.
patent: 5510613 (1996-04-01), Reilly et al.
patent: 5729014 (1998-03-01), Mordehai et al.
patent: 5739530 (1998-04-01), Franzen et al.
patent: 5818055 (1998-10-01), Franzen
patent: 6107628 (2000-08-01), Smith et al.
patent: 6140638 (2000-10-01), Tanner et al.
patent: 6153880 (2000-11-01), Russ, IV et al.
patent: 6225047 (2001-05-01), Hutchens et al.
patent: 6331702 (2001-12-01), Krutchinsky et al.
patent: 6515280 (2003-02-01), Baykut
patent: 6545268 (2003-04-01), Verentchikov et al.
patent: 6583408 (2003-06-01), Smith et al.
patent: 6674071 (2004-01-01), Franzen et al.
patent: 6707037 (2004-03-01), Whitehouse
patent: 6791078 (2004-09-01), Giles et al.
patent: 6803565 (2004-10-01), Smith et al.
patent: 6914241 (2005-07-01), Giles et al.
patent: 6949739 (2005-09-01), Franzen
patent: 6967325 (2005-11-01), Smith et al.
patent: 6977371 (2005-12-01), Bateman et al.
patent: 6979816 (2005-12-01), Tang et al.
patent: 2003/0098413 (2003-05-01), Weinberger et al.
patent: 2003/0136905 (2003-07-01), Franzen et al.
patent: 2004/0031920 (2004-02-01), Giles et al.
patent: 2004/0089803 (2004-05-01), Foley
patent: 2004/0129876 (2004-07-01), Franzen
patent: 2004/0195503 (2004-10-01), Kim et al.
patent: 2004/0211897 (2004-10-01), Kim et al.
patent: 2004/0227071 (2004-11-01), Giles et al.
patent: 2004/0251411 (2004-12-01), Bateman et al.
patent: 2005/0194542 (2005-09-01), Hieke
patent: 2005/0194543 (2005-09-01), Hieke
patent: 2005/0199820 (2005-09-01), Eastham
patent: 2005/0258354 (2005-11-01), Baba et al.
patent: 2005/0269519 (2005-12-01), Kim et al.
patent: 2006/0076484 (2006-04-01), Brown et al.
patent: 0964427 (1999-12-01), None
patent: WO 99/30351 (1999-06-01), None
patent: WO 00/77822 (2000-12-01), None
patent: WO 00/77822 (2000-12-01), None
patent: WO 02/097857 (2002-12-01), None
Bondarenko, P.V. et al., “A New Electrospray-Ionization Time-Of-Flight Mass Spectrometer With Electrostatic Wire Ion Guide”,Intl. J. Mass Spectrom. Ion Processes, 160, 241-258, 1997.
Hieke, A., “GEMIOS—a 64-Bit multi-physics Gas and Electromagnetic Ion Optical Simulator”,Proceedings of the 51stConference on Mass Spectrometry and Allied Topics, Jun. 8-12, 2003, Montreal, PQ, Canada.
Hieke, A., Theoretical and Implementational Aspects of an Advanced 3D Gas and Electromagnetic Ion Optical Simulator Interfacing with ANSYS Multiphysics,Proceedings of the International Congress on FEM Technology, pp. 1.6:13, Nov. 12-14, 2003, Postdam, Germany.
Hieke, A., “Development of an Advanced Simulation System for the Analysis of Particle Dynamics in LASER based Protien Ion Sources”,Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show Nanotech 2004, Mar. 7-11, 2004, Boston, MA, U.S.A.
Krutchinsky, A.N. et al., Orthogonal Injection of Matrix-Assisted Laser Desorption/Ionization Ions Into A Time-Of-Flight Spectrometer Through A Collisional Damping Interface,Rapid Communic. Mass Spectrom., 12, 508-518, 1998.
Loboda, et al., “A tandem quadrupole/time-of-flight mass spectrometer with a matrix-assisted laser desorption/ionization source: design and performance”;Rapid Communic. Mass Spectrom., 14:1047-1057, 2000.
Tsybin, Y.O. et al., “Improved Low-Energy Electron Injection Systems For High Rate Electron Capture Dissociation In Fourier Transform Ion Cyclotron Resonance Mass Spectrometry”,Rapid Communic. Mass Spectrom., 15, 1849-1854, 2001.

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