Ion source operating by surface ionization in particular for pro

Details Ion source operating by surface ionization in particular for pro Ion source operating by surface ionization in particular for pro

1987-11-06

1989-01-31

Boudreau, Leo H.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

3133621, 250423R, 250425, H01J 2700

Patent

active

048018490

ABSTRACT:
An ion source is described, including a source of neutral particles which arrive at an ionization support positioned inside a chamber which is closed by a cap and which includes lateral walls. The cap includes an outlet orifice opposite which a plate defines a main ionization active surface. An electric field is applied between said device and by an electrode place downstream from the orifice in the direction of ion emission and fitted with a corresponding opening. Overall, the ionization support defines, by virtue of its active surface, and by virtue of holes surrounding said central active surface, a baffle assembly which prevents neutral atoms from passing directly to the outlet orifice, and which contributes to a high degree of ionization.

REFERENCES:
patent: 2486452 (1949-11-01), Washburn et al.
patent: 3283193 (1966-11-01), Ellison
patent: 3336475 (1967-08-01), Kilpatrick
patent: 3852037 (1974-12-01), Kolb et al.
patent: 3864575 (1975-02-01), Hashmi et al.
patent: 4453078 (1984-06-01), Shimizu
Nuclear Instr. & Methods in Physic Research, vol. 185, Jun. 1981, Whealton, J. H., "Negative Ion Sources", pp 25-27.
Rev. Sci. Instrum., vol. 48, No. 2, Feb. 1977, Kashihira, N., "Source for Negative Halogen Ions", pp. 171-172.
Applied Physics Letters, vol. 28, No. 5, Mar. 1976, Rachidi, I., "Surface Ionization Negative Ion Source", pp. 292-294.

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