Ion source, method of operating the same, and ion source system

Radiant energy – Ion generation – With sample vaporizing means

Reexamination Certificate

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Details

C250S289000, C250S42300F, C315S111810

Reexamination Certificate

active

06844556

ABSTRACT:
In an ion source, within a support body which supports a plasma production chamber for producing a plasma on the basis of an ion source flange, a cavity is provided ranging from a position near the plasma production chamber to a position near the ion source flange. The cavity serves as a cooling medium passage which introduces a cooling medium to a position near the plasma production chamber to cool the plasma production chamber. The plasma production chamber is cooled at a position very near it by the cooling medium. Therefore, temperature of the plasma production chamber at the time of plasma production is kept at low temperatures.

REFERENCES:
patent: 6288403 (2001-09-01), Horsky et al.
patent: 6452338 (2002-09-01), Horsky
patent: 20030085663 (2003-05-01), Horsky
patent: 01-98469 (1989-06-01), None
patent: 2000-243308 (2000-09-01), None
patent: 2001-135253 (2001-05-01), None
patent: WO 0143157 (2001-06-01), None

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