Ion source having plasma chamber, an electron source, and a plas

Details Ion source having plasma chamber, an electron source, and a plas Ion source having plasma chamber, an electron source, and a plas

1992-11-18

1995-02-07

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511121, 31511131, 31323131, H01J 724

Patent

active

053878434

ABSTRACT:
The present invention aims to extract a large electron beam and extend the service life of an electron source by effectively radiating an electron beam with low energy from a plasma chamber toward an ion extraction port, and optimally neutralizing space charges of ions in the vicinity of the ion extraction port. An electron source is installed behind a plasma chamber to control an extraction power supply, an electron accelerating power supply, and a lens power supply. Thereby, an electron beam is extracted from the power source, and accelerated. Then, the electron beam is carried through an electric field lens at a high speed, decelerated in the vicinity of the plasma chamber, then converged to radiate toward the ion extraction port. An aperture is installed at a crossover point of the electron beam to diminish backward flow of ionic gas from the plasma chamber to the electron source.

REFERENCES:
patent: 4857809 (1989-08-01), Torii et al.
patent: 4931698 (1990-06-01), Yoshida
patent: 5089747 (1992-02-01), Koshiishi et al.
"Ion Source Technology", May 31, 1976, Ionics K.K., p. 196.

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