Ion source having auxillary ion chamber

Electric lamp and discharge devices – With positive or negative ion acceleration – Supplying ionizable material

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Details

31323131, 31511121, H05A 1300, H01J 724

Patent

active

051071703

ABSTRACT:
An ion source having an auxiliary plasma chamber and a main plasma chamber. The auxiliary plasma chamber receives an ionizable gas and is provided with microwaves with sufficient power to create a high frequency discharge and generate a subplasma for sustaining the creation of an ion plasma in the main chamber. Multiple auxiliary plasma chambers may be used and each may be separately regulated. Protective plates, screens, and coatings may be provided to protect the ion plasma of the main chamber from sputtering a facing wall of the auxiliary plasma chamber.

REFERENCES:
patent: 4757237 (1988-07-01), Hellblom et al.
patent: 4810935 (1989-03-01), Boswell
patent: 4859909 (1989-08-01), Gualandris et al.

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