Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1997-08-01
1998-12-22
Wong, Don
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511191, 31511121, 250423R, 20419234, H01J 724
Patent
active
058523456
ABSTRACT:
The present invention comprises an ion source apparatus for producing an ion beam from a solid material of arsenic or phosphorus. The ion source includes a plasma chamber having an inlet orifice and an outlet orifice wherein a non-toxic carrier gas is inputted into the plasma chamber. A means for generating a gas plasma is arranged within the plasma chamber and an electrically insulated platform is also arranged within the plasma chamber. A heatable wafer of solid source material of a metal phosphide or arsenide is attached to the platform, for conversion upon heating, into an ion beam.
REFERENCES:
patent: 3689766 (1972-09-01), Freeman
patent: 3774026 (1973-11-01), Chavet
patent: 5089746 (1992-02-01), Rosenblum et al.
patent: 5309064 (1994-05-01), Armini
Halgren Don
Implant Sciences Corp.
Philogene Haissa
Wong Don
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