Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1993-03-22
1994-05-03
Kwon, John T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511181, 250423R, H01J 724
Patent
active
053090640
ABSTRACT:
An ion source generating device having a main arc chamber and an auxiliary chamber attached to and in communication with the main chamber. The auxiliary chamber contains metal chips of barium, calcium or cerium to provide a reduction reaction of feed gas passing through the chamber and into the main chamber, in which ion beams are generated.
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patent: 5107170 (1992-04-01), Ishikawa
"Ion Implantation Techniques" by H. Ryssel and H. Glawischnig; Chapter 2 Ion Sources; Springer-Verlag 1982.
Halgren Don
Kwon John T.
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