Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1996-11-01
1998-09-15
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511121, 31511171, 250423R, H01J 724
Patent
active
058084169
ABSTRACT:
An ion source generating device having a main arc chamber and an auxiliary chamber attached to and in fluid communication with the main chamber. The auxiliary chamber contains solid reactants consisting of Ca.sub.3 P.sub.2 or Mg.sub.3 As.sub.2 to provide a reduction reaction of feed gas such as HF or H.sub.2 O respectively, passing through the chamber and into the main chamber, in which the ion beam is generated.
REFERENCES:
patent: 3689766 (1972-09-01), Freeman
patent: 3774026 (1973-11-01), Chavet
patent: 4533831 (1985-08-01), Itoh et al.
patent: 5089746 (1992-02-01), Rosenblum et al.
patent: 5189303 (1993-02-01), Tanjyo et al.
patent: 5309064 (1994-05-01), Armini
patent: 5517084 (1996-05-01), Leung
Halgren Don
Implant Sciences Corp.
Pascal Robert J.
Philogene Haissa
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