Ion source for an ion implanter

Radiant energy – Ion generation – With sample vaporizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250423R, H01J 2700

Patent

active

047193557

ABSTRACT:
An ion source of a type used on ion implanters which includes a crucible having a hollow interior and a hole for providing fluid communication between the interior of and exterior to the crucible. A heater assembly is used for adjustably heating the crucible. The crucible hole is if fluid communication with a passageway down the crucible and with a vapor nozzle aperture. An arc chamber has an inlet positioned at the output of the vapor nozzle aperture. The material to be vaporized does not bond to the crucible interior when solidified from a liquid state.

REFERENCES:
patent: 2824967 (1958-02-01), Kamen
patent: 3654457 (1972-04-01), Yano et al.
patent: 3700892 (1972-10-01), Bell, Jr. et al.
patent: 3789253 (1974-01-01), Kervizic et al.
patent: 4112137 (1978-09-01), Zega

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion source for an ion implanter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion source for an ion implanter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion source for an ion implanter will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-922155

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.