Ion source arc chamber seal

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S42300F, C250S426000, C250S427000

Reexamination Certificate

active

07655930

ABSTRACT:
An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A seals has a ceramic body having an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall.

REFERENCES:
patent: 5497006 (1996-03-01), Sferlazzo et al.
patent: 5703372 (1997-12-01), Horsky et al.
patent: 5763890 (1998-06-01), Cloutier et al.
patent: 5892232 (1999-04-01), Tsai et al.
patent: 5898172 (1999-04-01), Masui et al.
patent: 6517913 (2003-02-01), Cheung et al.
patent: 6750600 (2004-06-01), Kaufman et al.
patent: 6777686 (2004-08-01), Olson et al.
patent: 6847043 (2005-01-01), Murrell et al.
patent: 7102139 (2006-09-01), Low et al.
patent: 7116054 (2006-10-01), Zhurin
patent: 7276847 (2007-10-01), Olson et al.
patent: 7365339 (2008-04-01), Fujita et al.
patent: 7435971 (2008-10-01), Vanderberg et al.
patent: 7446326 (2008-11-01), Chaney et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion source arc chamber seal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion source arc chamber seal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion source arc chamber seal will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4154351

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.