Ion source application device

Details Ion source application device Ion source application device

1987-04-06

1989-07-25

Anderson, Bruce C.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

250423R, 2504923, H01J 3700, H05H 300

Patent

active

048516686

ABSTRACT:
An ion source application device comprising a gas tight plasma formation chamber sustaining a plasma produced by high frequency discharge, a high frequency coil producing the high frequency discharge, and means for extracting an ion beam from the plasma thus produced, characterized in that it comprises further an electron beam generator or a laser light generator as means for obtaining electrons serving as seeds for starting the high frequency discharge.

REFERENCES:
patent: 3956666 (1976-05-01), Reader et al.
patent: 4713585 (1987-12-01), Ohno et al.
patent: 4716491 (1987-12-01), Ohno et al.
Pak et al., Broad Beam Ion Source Operation with Four Common Gases, Rev. Scilnstrom 51(4), Apr., 1980, pp. 536-539.
Leung et al. Summary Abstract: Ratio Frequency Ion Source Development for Neutral Beam Applications, J. Voc. Sci. Tech, 2(2), Apr. Je 1984.

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