Ion source

Details Ion source Ion source

1991-02-28

1992-06-23

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912157, 21912143, 31511151, B23K 900

Patent

active

051245264

ABSTRACT:
An apparatus for the generation of an inductively excited ion or plasma source includes an amplification system and a high frequency excitation coil which are coupled to form a self-starting free-running excitation oscillator.

REFERENCES:
patent: 3814983 (1974-06-01), Weissfloch et al.
patent: 4381453 (1983-04-01), Cuomo et al.
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4795880 (1989-01-01), Hayes et al.
patent: 4849675 (1989-07-01), Muller
patent: 4894510 (1990-01-01), Nakanishi et al.
"Deposition of Tantalum and Tantalum Oxide by Superimposed RF and D-C Sputtering", by F. Vratny, pp. 505-508, Journal Electrochem. Society May 1967.

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