Radiant energy – Ion generation – Field ionization type
Reexamination Certificate
2006-05-19
2008-10-14
Wells, Nikita (Department: 2881)
Radiant energy
Ion generation
Field ionization type
C250S424000, C250S427000, C250S492210, C315S111810, C315S111910
Reexamination Certificate
active
07435971
ABSTRACT:
An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A temperature sensor monitors temperatures within the arc chamber and provides a signal related to sensed temperature. A controller monitors sensed temperature as measured by the sensor and adjusts the temperature to maintain the sensed temperature within a range.
REFERENCES:
patent: 5262652 (1993-11-01), Bright et al.
patent: 5497006 (1996-03-01), Sferlazzo et al.
patent: 5517077 (1996-05-01), Bright et al.
patent: 5554852 (1996-09-01), Bright et al.
patent: 5763890 (1998-06-01), Cloutier et al.
patent: 5857889 (1999-01-01), Abbott
patent: 5886355 (1999-03-01), Bright et al.
patent: 6136725 (2000-10-01), Loan et al.
patent: 6452338 (2002-09-01), Horsky
patent: 6975072 (2005-12-01), Leung et al.
patent: 2006/0097193 (2006-05-01), Horsky et al.
patent: 2006/0272776 (2006-12-01), Horsky et al.
patent: WO 01/43157 (2001-06-01), None
“Water Cooled Plasma Flood Source for Intense Ion Beam Implantation” to Zhimin Wan et al IEEE, 2002.
Beneviste Victor M.
Fallon John F.
Pokidov Ilya
Vanderberg Bo H.
Axcelis Technologies Inc.
Tarolli, Sundheim Covell & Tummino LLP
Wells Nikita
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