Ion source

Details Ion source Ion source

1991-10-11

1992-11-10

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511141, 3133591, 250423R, H01J 2702

Patent

active

051626993

ABSTRACT:
An ion source of high ion yield, especially boron yield, is provided with a boron compound of high melting point and low work function such as LaB.sub.6 (lanthanum hexaboride) at a suitable location inside the arc chamber of the ion source, which operates on the principle of ion production by using a hot cathode to produce hot electrons.

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patent: 5089746 (1992-02-01), Rosenblum et al.

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