Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-06-27
1984-05-01
Larkins, William D.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
357 23, 357 54, 204 1T, 204419, H01L 2978, G01N 2730
Patent
active
044464746
ABSTRACT:
An ion sensor and more particularly ion sensitive field effect transistor comprising an inorganic film, and an impurity layer formed in at least surface layer of said inorganic film by thermal diffusion or ion implantation.
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patent: 4273636 (1981-06-01), Shimada et al.
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patent: 4305802 (1981-12-01), Koshiishi
Esashi et al., IEEE Trans. on Biomedical Engineering, (BME-25, No. 2, Mar. 1978), pp. 184-192.
Moss et al., IEEE Trans. on Biomedical Engineering, (BME25, No. 1), Jan. 1978, pp. 49-54.
Esashi et al., Suppl. to Journal of the Japan Society of Applied Physics, vol. 44, 1975, pp. 339-343.
Abe Hiroshi
Esashi Masayoshi
Matsuo Tadayuki
Mizusaki Takashi
Larkins William D.
Olympus Optical Co,. Ltd.
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