Ion-projection apparatus and method of operating same

Details Ion-projection apparatus and method of operating same Ion-projection apparatus and method of operating same

1987-01-30

1989-08-22

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250398, 250396ML, H01J 3708

Patent

active

048598577

ABSTRACT:
A multipole corrective element with the individual poles being electromagnetically energized individually and selectively to create a variable field around a charged particle beam projected through a mask and a lens system onto a substrate, e.g. an ion-beam or electron-beam microlithography. The corrective element is provided independently of the ion-optical lens system between the latter and the mask, preferably proximal to the mask.

REFERENCES:
patent: 2919381 (1959-12-01), Glaser
patent: 2973433 (1961-02-01), Kramer
patent: 3845312 (1974-10-01), Allison
patent: 4090077 (1978-05-01), Anger
patent: 4362942 (1982-12-01), Yasuda
Ion Projection Microlithography; G. Stengl; R. Kaitna; H. Loschner; R. Rieder; P. Wolf; R. Sacher; pp. 104-109.

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