Radiant energy – Ionic separation or analysis
Patent
1991-02-12
1993-04-27
Anderson, Bruce C.
Radiant energy
Ionic separation or analysis
250283, B01D 5944, H01J 4940
Patent
active
052065065
ABSTRACT:
An ion processing unit (10) comprising a series of M perforated electrode sheets (12), driving electronics (14,16) and a central processing unit (18), allow formation, shaping and translation of multiple effective potential wells (42). Ions, trapped within a given effective potential well (42), can be isolated, transferred, cooled or heated, separated, and combined. Measurement of induced image currents allows measurement and typing of ion species by their respective mass-to-charge ratios. The combination of many electrode sheets (12), each having N multiple perforations (22), creates any number of parallel ion processing channels (26). The ion processing unit (10) provides an N by M massively parallel ion processing system, furnishing means for processing large numbers of ions in parallel in the same manner, but with different ion processes deployed at different sections of each ion processing channel (26). In addition, the space-filling parallel structure of the present invention provides an efficient means for storage of large numbers of ions, including charged antimatter.
REFERENCES:
patent: 2606291 (1952-08-01), Wilson
patent: 2768304 (1956-10-01), Wells et al.
patent: 2939952 (1960-06-01), Paul et al.
patent: 3258591 (1966-06-01), Blauth et al.
patent: 3501631 (1970-03-01), Arnold
patent: 3621242 (1971-11-01), Ferguson et al.
patent: 3715590 (1973-02-01), Auer
patent: 3819941 (1974-06-01), Carrico
patent: 4059761 (1977-11-01), Dawson
patent: 4066893 (1978-01-01), Dawson
patent: 4105917 (1978-08-01), McIver et al.
patent: 4117321 (1978-09-01), Meyer
patent: 4380046 (1983-04-01), Fung
patent: 4704532 (1987-11-01), Hua
patent: 4727474 (1988-02-01), Batcher
patent: 4755670 (1988-07-01), Syka et al.
patent: 4755671 (1988-07-01), Friedland et al.
patent: 4805091 (1989-02-01), Thiel et al.
patent: 4878735 (1989-11-01), Vilums
patent: 4882484 (1989-11-01), Franzen et al.
patent: 4900414 (1990-02-01), Sibadis
patent: 4914612 (1990-04-01), Beece et al.
patent: 5089702 (1992-02-01), Allemann et al.
Leclerc, G. Sanche, L., "Spreadsheets for Computing Charged-Particle Trajectories in 3-d Electrostatic Fields", Computers in Physics, Nov./Dec., pp. 617-626, 1990.
Schwarzschild, B., "Antiprotons Cooled to 4K and Weighed in a Penning Trap", Physics Today, pp. 17-20, Jul. 1990.
Dehmelt, H., "Radiofrequency Spectroscopy of Stored Ions: Storage", Advances in Atomic and Molecualr Physics, vol. 3, ed. Bates, D. and Estermann, I., Academic Press, New York, 1967, pp. 53-72.
Todd, J., "Ion Trap Mass Spectrometer--Past, Present and Future(?)" Mass Spectrometry Reviews, vol. 10, John Wiley & Sons, Inc., 1991, pp. 3-52.
Cornell, E., et al., "Single-Ion Cyclotron Resonance Measurement of M(CO+)/M(N2+)", Physical Review Letters, vol. 63, No. 16, Oct. 16, 1989, pp. 1674-1677.
Gabrielse, G. et al., "Cooling and Slowing of Trapped Antiprotons below 100 meV", Physical Review Letters, vol. 63, No. 13, Sep. 25, 1989, pp. 1360-1363.
Windland, D. et al. "Line Shifts and Widths of Axial, Cyclotron, and G-2 Resonances in tailored, Stored Electron (Ion) Cloud", International Journal of Mass Spectrometry and Ion Physics, 16, 1975, pp. 338-342.
Beverini, N. et al., "Stochastic Cooling In Penning Traps", Physical Review A, vol. 38, No. 1, Jul. 1, 1988, pp. 107-114.
Dahl, D. A., Delmore, J. E., "The SIMION PC/PS2 User's Manual, Version 4.0", Rev. 2, Idaho National Engineering Laboratory, Apr. 1988.
"Linear Ion Trap for Atomic Clock", NASA Tech Briefs, Sep. 1990, p. 44.
Anderson Bruce C.
Schipper John F.
Sobon Wayne P.
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