Ion plating method

Details Ion plating method Ion plating method

1976-01-12

1978-04-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118 491, 204298, C23C 1500

Patent

active

040826368

ABSTRACT:
In atomistic film deposition processes employing ion plating technology, an ion source is provided which includes a filament, an ionization electrode and an ion acceleration electrode. The voltage relationships between these electrodes are altered so as to form many kinds of fine-quality deposited films in a multi-layer fashion.

REFERENCES:
patent: 3583361 (1971-06-01), Laudel, Jr.
patent: 3732158 (1973-05-01), Przybyszewski et al.

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