Ion-nitriding process

Metal treatment – Compositions – Heat treating

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204192N, C23C 1116

Patent

active

041949307

ABSTRACT:
The present invention provides an ion-nitriding process wherein a workpiece having at least one aperture is subjected to a DC voltage in an atmosphere of nitrogen-containing gas, characterized in that a first nitriding step is carried out under a vacuum which is strong enough to suppress arc discharge on the workpiece, and a second nitriding step is carried out under a weaker vacuum as compared to that in the first step so that glow discharge is produced even in the aperture of the workpiece.

REFERENCES:
patent: 3190772 (1965-06-01), Berghaus et al.
patent: 3228809 (1966-01-01), Berghaus et al.
patent: 3650930 (1972-03-01), Jones et al.
patent: 3684590 (1972-08-01), Podgurski
patent: 3968019 (1976-07-01), Hanazono et al.
Mattox, "Recent Advances in Ion Plating", Proc. 6th Interntl. Vacuum Congr. 1974, pp. 443-450.

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