Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1979-09-04
1981-02-03
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
156643, C23C 1500
Patent
active
042486882
ABSTRACT:
Metals such as platinum and palladium are preferentially removed in the presence of their metal silicides by ion milling in a noble gas atmosphere such as argon. The process can be used on semiconductor chips to remove excess platinum after platinum silicide has been formed in the contact holes.
REFERENCES:
patent: 3271286 (1966-09-01), Lepselter
patent: 3642548 (1972-02-01), Eger
patent: 3770606 (1973-11-01), Lepselter
patent: 3860783 (1975-01-01), Schmidt et al.
patent: 3975252 (1976-08-01), Fraser et al.
patent: 4135998 (1979-01-01), Gniewek et al.
J. L. Vossen and W. Kern, editors, Thin Film Processes, Academic Press, New York, 1978.
Gartner Helmut M.
Petvai Steve I.
Sarkary Homi G.
Schnitzel Randolph H.
Bunnell David M.
International Business Machines - Corporation
Kaplan G. L.
Leader William
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