Ion milling apparatus

Details Ion milling apparatus Ion milling apparatus

1976-02-18

1976-12-21

Mack, John H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

219121EB, 219121P, C23C 1500

Patent

active

039987183

ABSTRACT:
To adapt ion milling of thin film devices to the requirements of large scale industrial production a configuration of ion source and device holders is proposed which allows the simultaneous processing of a large number of devices. In the proposed configuration ions are emitted radially from a cylindrical source and strike surfaces to be patterned on devices attached to device holders which rotate and revolve around the ion source in planetary fashion.

REFERENCES:
patent: 3501393 (1970-03-01), Wehner et al.
patent: 3652443 (1972-03-01), Fish et al.
patent: 3684678 (1972-08-01), Beardmore et al.
patent: 3708418 (1973-01-01), Quinn
P. G. Gloersen, "Ion Beam Etching", J. Vac. Sci. Technol. vol. 12, No. 1, Jan./Feb. 1975, pp. 28-35.
H. L. Garvin, "High Resolution Fabrication by Ion Beam Sputtering", Solid State Technology, Nov. 1973, pp. 31-36.

Affiliated with

Also associated with

Rating

Ion milling apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion milling apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion milling apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1837490