Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-12-05
2006-12-05
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298320, C156S345240, C156S345250, C156S345280
Reexamination Certificate
active
07144484
ABSTRACT:
A method for producing magneto resistive heads includes the steps of positioning at least two magneto resistive elements in spaced relation to one another and placing the at least two magneto resistive elements in an ion milling environment where material is removed nonselectively from items in the environment. A property of at least two of the plurality of magneto resistive elements is monitored. In response to monitoring, one of the at least two magneto resistive elements is dynamically covered to prevent additional removal of material from the covered magneto resistive element.
REFERENCES:
patent: 3193408 (1965-07-01), Triller
patent: 3400687 (1968-09-01), Lueck
patent: 4024291 (1977-05-01), Wilmanns
patent: 5777542 (1998-07-01), Ohsawa et al.
patent: 5796560 (1998-08-01), Saito et al.
patent: 5799388 (1998-09-01), Shouji
patent: 5805389 (1998-09-01), Saito et al.
patent: 6045671 (2000-04-01), Wu et al.
patent: 6074707 (2000-06-01), Nakazawa et al.
patent: 6077618 (2000-06-01), Sakakima et al.
patent: 6111729 (2000-08-01), Kamiguchi et al.
patent: 6178070 (2001-01-01), Hong et al.
patent: 6198378 (2001-03-01), Saito et al.
patent: 6201465 (2001-03-01), Saito et al.
patent: 6258468 (2001-07-01), Mahvan et al.
patent: 6287476 (2001-09-01), Ju et al.
patent: 6324036 (2001-11-01), Dill, Jr. et al.
patent: 09-243822 (1997-09-01), None
Hao Shanlin
Hoehn Joel William
Luse Todd Arthur
Peterson James Richard
Rejda Edwin Frank
McDonald Rodney G.
Seagate Technology LLC
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