Ion implanting method

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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204192N, 427 38, B05D 306

Patent

active

044042337

ABSTRACT:
The ion implantation is performed in a manner to vary the angle between an ion beam and an article to be implanted with ions, whereby it can be accomplished with remarkable ease while providing the impurity distribution which is flattened in the depthwise direction.

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patent: 3914857 (1975-10-01), Goser et al.
patent: 4030997 (1977-06-01), Miller et al.
patent: 4108751 (1978-08-01), King
patent: 4250009 (1981-02-01), Cuomo et al.
patent: 4274935 (1981-06-01), Schmelzer et al.
patent: 4275286 (1981-06-01), Hackett

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