Ion implanting apparatus

Details Ion implanting apparatus Ion implanting apparatus

1993-04-07

1994-09-20

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396ML, H01J 37317

Patent

active

053491963

ABSTRACT:
An ion implanting apparatus includes a magnetic quadrupole lens disposed between an ion source and an RFQ accelerator. The magnetic quadrupole lens carries out mass spectrometry of an ion beam extracted from the ion source while converging the ion beam, and reduces the divergence of the ion beam due to the space charge effect as compared to an electrostatic quadrupole lens. The use of the magnetic quadrupole lens makes it possible to utilize to a maximum extent the ion beam extracted from the ion source and to restrict to a minimum the reduction in the current of the ion beam during passage of the ion beam, thereby making it possible to generate a high-energy ion beam having a large current on the order of several tens of milliamperes.

REFERENCES:
patent: 3909305 (1975-09-01), Boroffka et al.
Hofmann et al, Nuclear Instruments and Methods in Physics Research B50, 1990, pp. 478-480.
Yamada et al, Nuclear Instruments and Methods in Physics Research B37/38, 1989, pp. 94-97.
Amemiya et al, Nuclear Instruments & Methods in Physics Research, Section--B: Beam Interactions with Materials and Atoms, vol. B55, No. 1-4, Apr. 1991, Amsterdam, NL, pp. 339-342.
DiBitonto et al, Nuclear Instruments & Methods in Physics Research, Section--B: Beam Interactions with Materials and Atoms, vol. B21, No. 2-4, Mar. 1987, Amsterdam, NL, pp. 155-157.

Affiliated with

Also associated with

Rating

Ion implanting apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion implanting apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion implanting apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2430124