Ion implanter with plural surface potential sensors

Details Ion implanter with plural surface potential sensors Ion implanter with plural surface potential sensors

1992-07-02

1994-07-05

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250397, H01J 3730

Patent

active

053269802

ABSTRACT:
An ion implanter including an ion beam generator for irradiating an ion beam toward a rotary drum having a front surface with a number of substrates fixed and equally spaced circumferentially thereof. The rotary drum is supported for rotation and reciprocation so that the substrates are exposed in succession to the ion beam. A plurality of surface potential sensors are positioned adjacent the front surface of the rotary drum. The surface potential sensors are positioned at different angular distances with respect to the ion beam for generating surface potential signals in response to surface potentials on the respective substrates. The surface potential sensors may be positioned on a line extending in a direction of reciprocation of the rotary disc for producing surface potential signals in response to surface potentials at different positions on each of the substrates.

REFERENCES:
patent: 4675530 (1987-06-01), Rose et al.
patent: 4904902 (1990-02-01), Tamai et al.
patent: 4914292 (1990-04-01), Tamai et al.
patent: 5089710 (1992-02-01), Kikuchi et al.
patent: 5138169 (1992-08-01), Yamazaki et al.
patent: 5198676 (1993-03-01), Benveniste et al.
Patent Abstracts of Japan, vol. 15, No. 453 (E-1134) Nov. 18, 1991 and JP-A-03 192 646 (Tokyo Kasoode Kenkyusho).

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