Ion implanter with beam resolving apparatus and method for impla

Details Ion implanter with beam resolving apparatus and method for impla Ion implanter with beam resolving apparatus and method for impla

1992-11-23

1994-04-26

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2505051, H01J 3709

Patent

active

053069200

ABSTRACT:
An ion implantation apparatus including a resolving aperture-shutter assembly (31) placed in the ion beam path (18). The resolving aperture-shutter assembly includes a movable shutter (34) and a shutter housing surrounding the movable shutter (34). Selected ions in an ion beam path (18) pass through a hole (44) in movable shutter (34) when the movable shutter (34) is in a first position, and are blocked by the solid surfaces when the movable shutter (34) is in a second position. The enclosure (32, 33, 39) completely surrounds the movable shutter (34). The enclosure (32, 33, 39) includes a first aperture (42) aligned with the ion beam path (18) for allowing the selected ions to enter the enclosure and a second aperture (41) aligned with the ion beam path (18) for allowing the selected ions to exit the enclosure after passing through the hole (44) in the movable shutter.

REFERENCES:
patent: 4017403 (1977-04-01), Freeman
patent: 4847504 (1989-07-01), Aitken
patent: 4916322 (1990-04-01), Glavish et al.
patent: 4943728 (1990-07-01), Dykstra et al.
patent: 5025167 (1991-06-01), Okuda et al.
patent: 5026997 (1991-06-01), Benveniste

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