Ion implanter

Details Ion implanter Ion implanter

1984-08-02

1987-01-06

Chatmon, Saxfield

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

250396ML, 2504923, 430323, H01J 724, H05B 3126

Patent

active

046349316

ABSTRACT:
Ions emitted from an ion source are dispersed by a dispersion means, and those ions of a predetermined mass number are extracted from the thus-dispersed ions and are selectively implanted into a sample. A plane of incidence of ions in the mass-dispersing means is so formed that the angle of incidence of ions thereon has a negative value, and a plane of emission of ions therein is so formed that the angle of emission of ions of the predetermined mass number therefrom has a positive value.

REFERENCES:
patent: 3500042 (1970-03-01), Castaing et al.
patent: 3920988 (1975-11-01), Taya et al.
patent: 4524275 (1985-06-01), Cottrell et al.

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