Ion implantation with variable implant angle

Details Ion implantation with variable implant angle Ion implantation with variable implant angle

1986-10-23

1988-05-17

Fields, Carolyn E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504421, H01V 3720

Patent

active

047452870

ABSTRACT:
A target holder for an ion implantation system is disclosed. The targets are supported on a disk which is mounted on a motor which spins the disk. The motor is in turn mounted on a shaft which makes a reciprocating scanning movement along its axis. The spinning of the disk and the reciprocation of the shaft provide uniform exposure of the targets to the incident ion beam. In addition, the shaft can be rotated about its axis to control the angle of incidence of the ion beam as it strikes the targets.

REFERENCES:
patent: 3778626 (1973-12-01), Robertson
patent: 4035655 (1977-07-01), Guernet et al.
patent: 4405864 (1983-09-01), del Rio
patent: 4553069 (1985-11-01), Purser

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