Ion implantation systems

Details Ion implantation systems Ion implantation systems

2010-03-18

2011-10-18

Nguyen, Kiet (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

08039821

ABSTRACT:
An ion implantation apparatus of high energy is disclosed in this invention. The new and improved system can have a wide range of ion beam energy at high beam transmission rates and flexible operation modes for different ion species. This high energy implantation system can be converted into a medium current by removing RF linear ion acceleration unit.

REFERENCES:
patent: 6414327 (2002-07-01), Klinkowstein et al.

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