Ion implantation system

Details Ion implantation system Ion implantation system

1981-03-19

1982-08-24

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250358, G01N 2300

Patent

active

043463010

ABSTRACT:
A plurality of beam generating units 76, 78, 80 and 82 each produces separated rectangular ion beams for implantation onto a targets 52 and 54 rotatively moving therepast. Each rectangular footprint is long in the direction of motion and is scanned transversely to the direction of motion. A plurality of beam generating units can be positioned adjacent to each other to multiply implant targets because of the compact structure of the separated ion source.

REFERENCES:
patent: 3983402 (1976-09-01), Arndt et al.
patent: 4013262 (1977-03-01), Schott
patent: 4017403 (1977-04-01), Freeman
patent: 4163151 (1979-07-01), Bayless et al.
patent: 4276477 (1981-06-01), Enge

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