Boots – shoes – and leggings
Patent
1998-02-26
1999-12-07
Teska, Kevin J.
Boots, shoes, and leggings
39550023, 364178, 708290, G06F 300
Patent
active
059997192
ABSTRACT:
An ion implantation process simulation device includes a Dual Pearson data extracting unit for generating a Dual Pearson data table from ion implantation profile data, a Dual Pearson data for interpolation obtaining unit for obtaining a parameter for use in the interpolation and extrapolation of a dose coefficient from the Dual Pearson data table, a dose coefficient interpolating/extrapolating unit for expressing an ion implantation profile by linear connection of two functions respectively representing an amorphous component and a channeling component, as well as using a dose-independent moment parameter and a coefficient of linear connection dependent on dose to interpolate and extrapolate a logarithmic value of a channeling component dose coefficient with respect to logarithmic values of all dose values, and a simulation result outputting unit for outputting a simulation result.
REFERENCES:
patent: 5719796 (1998-02-01), Chen
patent: 5845105 (1998-12-01), Kunikiyo
patent: 5859784 (1999-01-01), Sawahata et al.
patent: 5889687 (1999-03-01), Enda
Al F. Tasch et al., "An Improved Approach to Accurately Model Shallow B and BF.sub.2 Implants in Silicon", J. Electrochem. Soc., vol. 136, No. 3, Mar. 1989, pp. 810-814.
Asada Susumu
Sawahata Koichi
NEC Corporation
Pham Thai
Teska Kevin J.
LandOfFree
Ion implantation process simulation device realizing accurate in does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ion implantation process simulation device realizing accurate in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion implantation process simulation device realizing accurate in will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-833930