Ion implantation ion source, system and method

Details Ion implantation ion source, system and method Ion implantation ion source, system and method

2006-04-04

2006-04-04

Berman, Jack I. (Department: 2881)

Radiant energy

Ion generation

Electron bombardment type

C250S425000, C250S426000, C250S492210, C315S111810

Reexamination Certificate

active

07022999

ABSTRACT:
A multi mode ion source is disclosed that includes an ion source incorporating an ionization chamber for ionizing gas species and configured to have at least two discrete modes of operation; namely, an arc-discharge mode and a non-arc discharge mode of operation.

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patent: 5556204 (1996-09-01), Tamura et al.
patent: 6111260 (2000-08-01), Dawson et al.
patent: 6452338 (2002-09-01), Horsky

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