Ion implantation in metal alloys

Details Ion implantation in metal alloys Ion implantation in metal alloys

1991-12-18

1993-04-06

Dean, R.

Metal treatment

Process of modifying or maintaining internal physical...

With ion implantation

148 97, 148900, 20419211, 20419212, 20419232, 428610, 427528, 427531, C23C 836

Patent

active

051999994

ABSTRACT:
A method for ion implantation of relatively high concentrations of alloying elements into a metal target without sputtering the target, in which the target is precoated with a layer of preselected thickness of a light, low sputtering yield element such as carbon, which is ablated during the ion implantation process.

REFERENCES:
patent: 4743308 (1988-05-01), Sioshansi et al.
patent: 4855026 (1989-08-01), Sioshansi
Z. L. Liau and J. W. Mayer, "Limits of Composition Achievable by Ion Implantation", J. Vac. Sci. Technol., 15(5), Sep./Oct. 1978, pp. 1629-1635.

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