Ion implantation equipment

Details Ion implantation equipment Ion implantation equipment

1990-09-04

1992-02-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

25044211, H01J 37317

Patent

active

050897101

ABSTRACT:
An ion implantation equipment for implanting ion beam into an implanting target characterized in that an electrons are induced to the direction of an ion beam being injected to said implanting target, and a predetermined bias voltage is applied between a plasma generation chamber and Faraday.

REFERENCES:
patent: 4135097 (1979-01-01), Formeris et al.
patent: 4249077 (1981-02-01), Crawford
patent: 4361762 (1982-11-01), Douglas
patent: 4419203 (1983-12-01), Harper et al.
patent: 4675530 (1987-06-01), Rose
patent: 4886971 (1989-12-01), Matsumura et al.
patent: 4933546 (1990-06-01), Muntz et al.
patent: 4939360 (1990-07-01), Sakai

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