Ion implantation device

Details Ion implantation device Ion implantation device

1990-06-19

1991-12-03

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511191, 250423R, H01J 2702

Patent

active

050702750

ABSTRACT:
An ion implantation device which is characterized in that source gas is supplied to an ion source from a gas cylinder provided in an external portion of the ion implantation device to maintain the cleanness of the clean room by reducing the frequency of exchanging gas cylinder for new one.

REFERENCES:
patent: 4124802 (1978-11-01), Terasawa et al.
patent: 4560879 (1985-12-01), Wu et al.
patent: 4634931 (1987-01-01), Taya et al.
patent: 4782304 (1988-11-01), Aitken
patent: 4881010 (1989-11-01), Jetter
patent: 4883969 (1989-11-01), Ishida et al.
patent: 4893019 (1990-01-01), Oomori et al.

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