Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2011-07-19
2011-07-19
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200, C250S492100, C250S424000, C250S42300F, C250S3960ML
Reexamination Certificate
active
07982197
ABSTRACT:
A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. Detachable connections in the cooling fluid conduits in the vacuum chamber may comprise tandem seals with an intermediate chamber between them which can be vented outside the vacuum chamber, or independently vacuum pumped. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel.
REFERENCES:
patent: 4608513 (1986-08-01), Thompson
patent: 4733091 (1988-03-01), Robinson et al.
patent: 4831270 (1989-05-01), Weisenberger
patent: 4847504 (1989-07-01), Aitken
patent: 5306921 (1994-04-01), Tanaka et al.
patent: 5350926 (1994-09-01), White et al.
patent: 5389793 (1995-02-01), Aitken et al.
patent: 5753923 (1998-05-01), Mera et al.
patent: 5834786 (1998-11-01), White et al.
patent: 6677594 (2004-01-01), Young
patent: 6770888 (2004-08-01), Benveniste et al.
patent: 2002/0139307 (2002-10-01), Ryding et al.
patent: 2010/0327178 (2010-12-01), Glavish et al.
patent: 2010/0327181 (2010-12-01), Ryding et al.
patent: 2010/0327190 (2010-12-01), Glavish et al.
patent: 2004/114356 (2004-12-01), None
Notice of Allowanced dated Mar. 29, 2011 for U.S. Appl. No. 12/494,272.
H.A. Enge, Focusing of Charged Particles vol. II, ed. A Septier, Academic Press, 1962, p. 214-217, New York, USA.
Pierre, Donald A., Optimization Theory with Applications, 1986, p. 274-277, 320-323,& 354-355, Dover Publications, Inc., New York, USA.
U.S. Appl. No. 12/122,108, filed May 16, 2008, entitled “Ion Implanter for Photovoltaic Cell Fabrication”.
International Search Report and Written Opinion dated Dec. 9, 2010 for PCT/US2010/039191.
Gillespie Joseph Daniel
Purser Kenneth Harry
Ryding Geoffrey
Smick Theodore H.
Twin Creeks Technologies, Inc.
Wells Nikita
LandOfFree
Ion implantation apparatus and a method for fluid cooling does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ion implantation apparatus and a method for fluid cooling, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion implantation apparatus and a method for fluid cooling will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2664373