Ion implantation apparatus

Details Ion implantation apparatus Ion implantation apparatus

1990-05-14

1991-09-03

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302, H01J 37317

Patent

active

050461486

ABSTRACT:
In an ion implantation apparatus comprising scanning electrodes for electrically scanning an ion beam in an X direction, a scanning power supply for supplying a scanning power to the scanning electrodes, a drive unit for mechanically scanning a target in a Y direction substantially perpendicular to the X direction, a beam current measurement device disposed at one end section of the scanning area of the ion beam for measuring a beam current of the ion beam, and a control unit for computing the scanning speed of the target based on the beam current measured by the beam current measurement device and for controlling the drive unit so that the target is driven at the computed speed, the control unit outputs a trigger signal whenever the computation process of the scanning speed of the target is completed, and the scanning power supply outputs the scanning power for one reciprocative scanning operation of the ion beam at every time the scanning power supply receives the trigger signal from the control unit.

REFERENCES:
patent: 4733091 (1988-03-01), Robinson et al.
patent: 4899059 (1990-02-01), Freytsis et al.
patent: 4922106 (1990-05-01), Berrian et al.

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