Ion implant using tetrafluoroborate

Details Ion implant using tetrafluoroborate Ion implant using tetrafluoroborate

1988-05-06

1989-07-25

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 47, 437 21, 437 22, B05D 306

Patent

active

048512559

ABSTRACT:
Metal tetrafluoroborates, alkali and alkaline earth tetrafluoroborates in particular, and preferably lithium tetrafluoroborate are used as ion source materials in ion implantation of semiconductor materials with boron.

REFERENCES:
patent: 4622236 (1986-11-01), Morimoto et al.
patent: 4634600 (1987-01-01), Shimizu et al.
patent: 4656052 (1987-04-01), Satou et al.
patent: 4759836 (1988-07-01), Hill et al.

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