Ion current generator system for thin film formation, ion implan

Details Ion current generator system for thin film formation, ion implan Ion current generator system for thin film formation, ion implan

1988-04-26

1990-01-09

Fields, Carolyn E.

Radiant energy

Ion generation

Field ionization type

250423P, 2504922, 2504931, 3133631, 31323141, 31511181, H01J 3708

Patent

active

048930199

ABSTRACT:
The ion current generator is employed for thin film formation, ion implantation, etching, sputtering or the like. A vaporizer supplies material atoms to a predetermined region, and then, the material atoms are excited to a Rydberg state by lasers supplied from laser oscillators. The material atoms thus excited are ionized by an electric field applied from electric field application means, to be lead to a predetermined direction. Accordingly, an ion current can be generated at a high efficiency and low cost.

REFERENCES:
patent: 3914655 (1975-10-01), Dreyfus et al.
patent: 4020350 (1977-04-01), Ducas
patent: 4061921 (1982-04-01), Cantrell et al.
patent: 4070580 (1978-01-01), Gallagher et al.
patent: 4433241 (1984-02-01), Boesl et al.
patent: 4692627 (1987-09-01), Ueda et al.
patent: 4716295 (1987-12-01), Ueda et al.

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